Platform Characteristics

Deposition-to-characterization path.

01

Multi-element PVD

Co-sputter up to 7 elements onto a 100 mm wafer using DC, RF, pulsed DC, HiPIMS, or reactive sputtering.

02

Physical sample library

Create a real composition-spread thin-film library with 342 registered measurement positions.

03

Composition map

Map element ratios by EDX/EDS or WDX for the material system.

04

Structure and properties

Measure XRD phase data and selected electrical, mechanical, optical, magnetic, or electrochemical response.

05

Scoped follow-up

Scanning droplet cell (SDC), SECCM, XPS, microscopy, or interface analysis can be added when surface change or a localized measurement decides the next step.

06

Next experiment

Measured maps, Bayesian optimization, or Gaussian-process selection support repeat samples or a narrower campaign.

Material decision

Where this applies.

Relevant areas

Relevant systems include transition-metal nitrides, functional oxides, perovskite oxides, hard coatings, transparent films, and catalyst-relevant oxide systems.

Experimental plan

Use reactive sputtering to create composition gradients, map composition and phase, measure the target property, and select narrower process or composition ranges.

Examples

  • Cr-Al-N and related hard nitrides
  • Functional oxides
  • Perovskite oxide libraries
  • Catalyst-relevant oxide films

Methods used

  • reactive sputtering
  • automated XRD
  • EDX/EDS or WDX mapping
  • nanoindentation
  • UV-VIS
  • four-point probe

Measurements

  • stoichiometry
  • phase
  • texture
  • hardness
  • elastic modulus
  • conductivity
  • optical response

Outputs

  • phase-property maps
  • hardness and modulus maps
  • oxide or nitride candidates for follow-up
  • narrower follow-up campaigns
What comes back: Measured oxide or nitride ranges for coating, catalyst, hardware, or device tests.

Figures

Phase, process, and property figures.

Structure-zone maps across aluminum content and deposition temperature.

Structure-zone diagram

Measured and predicted microstructure classes define process ranges for thin-film samples.Banko et al., Commun. Mater. 2020, Fig. 6
High-throughput characterization methods for thin-film material libraries.

Library-scale characterization

Composition, structure, magnetic, electrical, optical, mechanical, and microstructure measurements feed measured maps.Ludwig, npj Comput. Mater. 2019, Fig. 2

Closest Evidence

Closest published oxide and nitride demonstrations.

Banko et al., ACS Comb. Sci. 2019

Cr-Al-N composition and process study

Reactive sputtering, automated XRD, plasma diagnostics, hardness, and elastic modulus were measured for Cr-Al-N films.Open source

Piotrowiak et al., Adv. Eng. Mater. 2023

Perovskite oxide property ranges

Oxide libraries connected phase formation with band gap, conductivity, and catalyst-relevant properties.Open source

Banko et al., Commun. Mater. 2020

Processing-library microstructure model

Processing libraries linked deposition conditions to thin-film microstructure.Open source

Platform Basis

Methods behind the screen.

Ludwig, npj Comput. Mater. 2019

Combinatorial thin-film synthesis, high-throughput characterization, data handling, and composition-property mapping.Open source

Banko et al., npj Comput. Mater. 2021

Deep-learning visualization and novelty detection for large XRD datasets from thin-film measurements.Open source

References

Cited sources.