Platform Characteristics

Deposition-to-characterization path.

01

Multi-element PVD

Co-sputter up to 7 elements onto a 100 mm wafer using DC, RF, pulsed DC, HiPIMS, or reactive sputtering.

02

Physical sample library

Create a real composition-spread thin-film library with 342 registered measurement positions.

03

Composition map

Map element ratios by EDX/EDS or WDX for the material system.

04

Structure and properties

Measure XRD phase data and selected electrical, mechanical, optical, magnetic, or electrochemical response.

05

Scoped follow-up

Scanning droplet cell (SDC), SECCM, XPS, microscopy, or interface analysis can be added when surface change or a localized measurement decides the next step.

06

Next experiment

Measured maps, Bayesian optimization, or Gaussian-process selection support repeat samples or a narrower campaign.

Material decision

Where this applies.

Relevant areas

Relevant systems include conductive protective surfaces, bipolar-plate coating directions, adhesion layers, current collectors, bonding layers, and films or interfaces near layer-stack integration.

Experimental plan

Prepare coating or interface libraries, map composition and structure, measure corrosion potential with scanning droplet cell (SDC) and contact resistance with four-point probe, then select samples for reliability tests.

Examples

  • Bipolar plate coating directions
  • Conductive protective surfaces
  • Adhesion and bonding layers
  • Current-collector, bonding, and layer-stack films

Methods used

  • co-sputtered alloy libraries
  • reactive sputtering
  • scanning droplet cell (SDC)
  • four-point probe
  • XRD mapping
  • nanoindentation

Measurements

  • composition
  • phase
  • corrosion potential
  • contact resistance
  • hardness or modulus
  • surface change

Outputs

  • coating composition or process ranges for follow-up
  • corrosion-potential maps
  • contact-resistance maps
  • samples for coupon or package-level tests
What comes back: Measured coating and interface samples for hardware reliability, package-level reliability, or production qualification tests.

Figures

Coating and process figures.

Combinatorial thin-film workflow for materials-library studies.

Combinatorial thin-film workflow

A material library connects synthesis, high-throughput characterization, data handling, and candidate selection.Ludwig, npj Comput. Mater. 2019, Fig. 1
Structure-zone maps across aluminum content and deposition temperature.

Structure-zone diagram

Measured and predicted microstructure classes define process ranges for thin-film samples.Banko et al., Commun. Mater. 2020, Fig. 6

Closest Evidence

Closest coating and surface demonstrations.

Buenconsejo et al., ACS Comb. Sci. 2012

Twenty-four libraries for irreversible tests

Multiple ternary thin-film libraries were prepared on one substrate for tests such as etching, annealing, and exposure.Open source

Banko et al., ACS Comb. Sci. 2019

Cr-Al-N coating process maps

Reactive sputtering, XRD, plasma diagnostics, hardness, and elastic modulus were connected for coating development.Open source

RUB ELAN nanoelectrochemistry

Local electrochemical access

Scanning electrochemical methods support localized electrochemical measurements on defined regions.Open source

Platform Basis

Methods behind the screen.

Ludwig, npj Comput. Mater. 2019

Combinatorial thin-film synthesis, high-throughput characterization, data handling, and composition-property mapping.Open source

Banko et al., Commun. Mater. 2020

Processing libraries and generative machine learning used to select thin-film microstructure ranges.Open source

References

Cited sources.