Platform Characteristics

Deposition-to-characterization path.

01

Multi-element PVD

Co-sputter up to 7 elements onto a 100 mm wafer using DC, RF, pulsed DC, HiPIMS, or reactive sputtering.

02

Physical sample library

Create a real composition-spread thin-film library with 342 registered measurement positions.

03

Composition map

Map element ratios by EDX/EDS or WDX for the material system.

04

Structure and properties

Measure XRD phase data and selected electrical, mechanical, optical, magnetic, or electrochemical response.

05

Scoped follow-up

Scanning droplet cell (SDC), SECCM, XPS, microscopy, or interface analysis can be added when surface change or a localized measurement decides the next step.

06

Next experiment

Measured maps, Bayesian optimization, or Gaussian-process selection support repeat samples or a narrower campaign.

Material decision

Where this applies.

Relevant areas

Relevant questions include composition and process ranges where phase purity, texture, electrode compatibility, and film stress decide the next experiment.

Experimental plan

Prepare composition or process gradients, measure structure and electrical indicators, then select regions for tests in a device layer stack or resonator.

Examples

  • AlN and doped AlN films
  • AlScN or ScAlN composition ranges
  • Texture and phase screens
  • Electrode-compatible layer stacks

Methods used

  • composition gradients
  • process gradients
  • XRD phase and texture mapping
  • four-point probe
  • follow-up depositions that keep the intended layer stack in mind

Measurements

  • phase
  • texture
  • thickness
  • stress indicator
  • leakage or resistance
  • electrode compatibility

Outputs

  • process ranges
  • samples for device tests
  • excluded phase regions
  • variables to test in the layer stack
What comes back: Measured composition and process ranges for resonator-level or device layer stack tests.

Figures

Process and structure figures.

Structure-zone maps across aluminum content and deposition temperature.

Structure-zone diagram

Measured and predicted microstructure classes define process ranges for thin-film samples.Banko et al., Commun. Mater. 2020, Fig. 6
Variational autoencoder workflow and latent-space plots for XRD patterns.

XRD latent-space analysis

Large diffraction datasets are organized by phase similarity and structure signals before regions are selected.Banko et al., npj Comput. Mater. 2021, Fig. 1

Closest Evidence

Relevant process and structure demonstrations.

Banko et al., Commun. Mater. 2020

Process-microstructure selection

Processing libraries linked deposition parameters to measured microstructure in thin films.Open source

Banko et al., npj Comput. Mater. 2021

XRD analysis at library scale

Large XRD datasets were organized to compare structure signals across measured samples.Open source

Platform Basis

Methods behind the screen.

Ludwig, npj Comput. Mater. 2019

Combinatorial thin-film synthesis, high-throughput characterization, data handling, and composition-property mapping.Open source

Banko and Ludwig, ACS Comb. Sci. 2020

Experimental materials data management for linked samples, metadata, and analysis workflows.Open source

References

Cited sources.