Technical basis

The method stays tied to physical samples.

Broad screening campaigns can create 100 mm composition-spread libraries. Narrower questions can start from selected prototype coatings, controlled films, coated coupons, or scoped test structures when the substrate, stack, and measurement route fit.

Deposition scope

Multisource magnetron co-sputtering supports metals, alloys, nitrides, oxides, and selected reactive sputtering questions.

Registered measurements

In the standard screening workflow, 342 positions are tied to wafer coordinate, composition, structure, and selected property data.

Measured maps

EDX/EDS composition mapping, XRD phase data, and selected property measurements are connected into composition-property maps.

Process variables

When growth controls the result, campaigns can scope temperature, bias, pressure, reactive-gas ratio, seed layer, electrode layer, or stack choice.

Project extensions

XPS, microscopy, depth profiles, localized electrochemistry, or partner methods can be added when the next decision needs them.

Follow-up deposition

Candidate compositions or process windows can be repeated as controlled films, coated samples, coated coupons, or scoped test structures for the customer's next validation format.

Technical visuals

Measured-map workflow visuals.

Concept visual of registered positions on a circular wafer.

Registered wafer positions

Physical location is tied to measured composition and properties.
Concept visual of a selected region on a circular wafer library.

Selected library region

A measured wafer region is selected for repeat deposition or a narrower follow-up.
Concept visual of a circular thin-film wafer library with a smooth composition gradient.

Physical wafer library

One wafer carries many related material variants for the same project question.
Concept visual of a circular wafer library beside larger coated sample formats.

Wafer to larger samples

Selected wafer regions can guide larger coated formats when the next validation step needs them.

Sputtered film screening

Before committing to a custom alloy sputter target.

Custom alloy sputter targets can be slow, expensive, and composition-locking. For sputtered film programs, xemX can co-sputter from multiple elemental or material sources and tune film ratios during deposition before teams commit to a custom target, production-format wafer run, or device-level validation.

Test physical films first

Co-sputtered libraries let teams test many nearby film compositions before committing to one target composition or downstream validation path.

Bridge modeling and target procurement

DFT, modeling, or customer experience can nominate a composition. xemX tests whether that composition produces a usable physical film before target manufacturing or production-format validation.

Include process-window questions

Campaigns can include selected growth variables when phase, texture, crystallinity, stress, resistivity, seed layer, electrode layer, or reactive sputtering conditions decide the result.

xemX does not replace final device, resonator, or fab qualification. It identifies the film ratios and process windows that deserve that work.